Jeff Brubaker of Synopsys Joins Si2 OpenAccess Change Team

Jeff Brubaker, infrastructure architect for Custom Compiler at Synopsys, has been elected to the Si2 OpenAccess Change Team. OpenAccess, the world’s most widely used, open-reference database for IC design, creates authentic interoperability between EDA companies and semiconductor designers and manufacturers.

Jeff started working on custom design tools at Avanti in 2000 and joined Synopsys in 2002. In 2004, he was on the Synopsys team which started the product that eventually became Custom Compiler–the Synopsys design environment for full-custom analog, custom digital, and mixed-signal IC design. He has worked with OpenAccess since 2005 and currently manages the Synopsys team responsible for OpenAccess-related development and maintenance.

Si2 Launches Survey on Artificial Intelligence and Machine Learning in EDA

Si2 has launched an industry-wide survey to identify planned usage and structural gaps for prioritizing and implementing artificial intelligence and machine learning in semiconductor electronic design automation.

The survey is organized by a recently formed Si2 Special Interest Group chaired by Joydip Das, senior engineer, Samsung Electronics, and co-chaired by Kerim Kalafala, senior technical staff member, EDA, and master inventor, IBM. The 18-member group will identify where industry collaboration will help eliminate deficiencies caused by a lack of common languages, data models, labels, and access to robust and categorized training data.

This SIG is open to all Si2 members. Current members include:

  • Advanced Micro Devices
  • Cadence Design Systems
  • Hewlett Packard Enterprise
  • IBM
  • Intel
  • Intento Design
  • Keysight Technologies
  • Mentor, a Siemens Business
  • NC State University
  • PFD Solutions
  • Qualcomm
  • Samsung Electronics
  • Sandia National Laboratories
  • Silvaco
  • Synopsys
  • Thrace Systems
  • Texas Instruments

The survey is open April 15 – May 15.

The survey link is:

Leigh Anne Clevenger, Si2 senior data scientist, said that the survey results would help prioritize SIG activities and timelines. “The SIG will identify and develop requirements for standards that ensure data and software interoperability, enabling the most efficient design flows for production,” Clevenger said. “The ultimate goal is to remove duplicative work and the need for data model translators, and focus on opening avenues for breakthroughs from suppliers and users alike.”

“High manufacturing costs and the growing complexity of chip development are spurring disruptive technologies such as AI and ML,” Clevenger explained. “The Si2 platform provides a unique opportunity for semiconductor companies, EDA suppliers and IP providers to voice their needs and focus resources on common solutions, including enabling and leveraging university research.

Support for OpenAccess 22.50 Ends in June

Effective June 1, 2020, OpenAccess 22.50 (DM5) will no longer be supported and no further source code changes will be made.

What this means for OpenAccess Coalition Members

The present OA 22.50 releases will be available for the near future, although members should consider plans to migrate to the new OpenAccess 22.60 (DM6). The migration plan is well designed as your OA 22.50 database still works in 22.60.

Should you choose to use the new data model features of OA 22.60 your database will become a DM6 database and can only be read with 22.60.

Going forward, the focus will be on the new OA22.60 data model. This includes support for C++ 11. New oaPartitions classes enable performance and portability enhancements to your applications, including parallel execution with partial loading of data.

The 4G limits have been relaxed on polygon point data and certain types of application defined data. In most cases, databases written by OA 22.60 will remain DM5/OA 22.50 compatible. OA 22.60 will only write a DM6 database if:

  • more than 4G of oaAppProp or oaPointArray data is used or,
  • oaPartitions are created

For more information contact Marshall Tiner, director of Production Standards,